Intel has completed acceptance testing of the industry’s first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass production of its 14A process node. This milestone marks the transition of high-NA EUV technology from research and development verification to high-volume manufacturing (HVM), enabling wafer throughput of 175 per hour and reinforcing Intel’s efforts to reclaim leadership in advanced semiconductor processes.

On December 17, Rapidus announced a new suite of AI-based semiconductor design tools under its Rapidus AI-Assisted Design Solution (Raads), aimed at supporting the company’s Rapid and Unified Manufacturing Service (RUMS) concept. The technology will be rebranded as Rapidus AI-Agentic Design Solution, with multiple tools scheduled for release starting in 2026. Customers will receive the tools alongside a process design kit (PDK) and reference flows.

As global demand for AI computing power intensifies, China’s domestic GPU sector has reached a milestone. Following Moore Threads’ successful IPO earlier this month, MetaX, a GPU developer with deep AMD roots, listed on Shanghai’s STAR Market on December 17.